AMAT 0041-76691 Heater

AMAT  0041-76691 Heater

Product Details Introduction

AMAT 0041-76691 Heater

Product Overview

AMAT (Applied Materials) 0041-76691 heater is a specialized process heating component used in semiconductor manufacturing equipment, mainly used to control the temperature environment of vacuum chambers or process platforms. Through precise heating and temperature stability management, this heater provides ideal process conditions for deposition, etching, ion implantation, and other processes, ensuring the quality and stability of thin film deposition.

Technical parameters (typical direction, specific parameters need to refer to the original factory information)

Heating method: resistance heating/ceramic heating plate form

Temperature control range: supports stable adjustment from room temperature to several hundred degrees Celsius

Accuracy: Equipped with a closed-loop temperature control mechanism, high temperature control accuracy

Compatibility: Compatible with AMAT PVD, CVD and other platforms

Material characteristics: high temperature resistance, corrosion resistance, suitable for vacuum and reactive atmosphere environments

Application scenarios

Semiconductor front-end process

CVD (Chemical Vapor Deposition): Heating the reaction chamber or wafer substrate to ensure uniform deposition of thin films.

PVD (Physical Vapor Deposition): Provides a stable heat source for the target material or cavity, ensuring consistent thickness of the deposited layer.

Etching process: Maintain stable chamber temperature during plasma etching to prevent residue deposition.

Ion implantation system

Provide substrate preheating or process constant temperature required during ion implantation to improve ion implantation uniformity.

Wafer processing and cleaning

In wet or dry cleaning processes, heating is used to improve chemical reaction rates and optimize cleaning efficiency.

Vacuum chamber environment control

Used to maintain a constant temperature inside the cavity, avoiding condensation or particle contamination.

Improve the stability of vacuum systems in high-temperature environments.

R&D and experimental platform

Applied to the process development laboratory for exploring new material deposition and process windows.

AMAT  0041-76691 Heater  Product imag

AMAT  0041-76691 Heater Related website links

SC510 3BSE003832R1 Communication Module
SC520 3BSE003816R1 Industrial card
SR511 3BSE000863R1 industrial module

Other website links

Kollmorgen PRD-B040EAIB-33 CE03550伺服驱动器
Rexroth  DKCXX.3-040-7生态驱动器
AO2000  LS25气体分析器