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  • AMAT Applied Materials 0100-03320 Gas Panel
  • AMAT Applied Materials 0100-03320 Gas Panel
  • AMAT Applied Materials 0100-03320 Gas Panel
AMAT Applied Materials 0100-03320 Gas Panel AMAT Applied Materials 0100-03320 Gas Panel AMAT Applied Materials 0100-03320 Gas Panel

AMAT Applied Materials 0100-03320 Gas Panel

AMAT Applied Materials 0100-03320 Gas Panel

Product Details Introduction

Product Overview

AMAT 0100-03320 gas panel is a key component used in semiconductor equipment for precise control and distribution of process gases. It integrates functions such as gas flow control, pressure regulation, valve switching, and safety monitoring, and is used to deliver multiple gases into the process chamber in precise proportions, pressures, and flow rates. It is one of the core systems for achieving process stability in semiconductor manufacturing processes such as chemical vapor deposition (CVD) and etching (Etch).

Product Features

High precision gas control capability

By combining a mass flow controller (MFC), solenoid valve, and pressure sensor, precise flow and pressure regulation can be achieved.

Support parallel control of multiple gases to ensure stable and consistent process atmosphere.

Modular design structure

The panel structure is compact and adopts a standardized module layout, which is easy to maintain and upgrade.

Quickly replace valve groups, filters, or pressure regulating units to reduce equipment downtime.

Improved safety and protective measures

Equipped with overvoltage, overcurrent, and gas leakage detection functions to ensure operational safety.

All pipelines, joints, and seals are made of corrosion-resistant materials (such as stainless steel, Viton, etc.).

Integrated intelligent monitoring

It can communicate with the AMAT main control system to achieve real-time monitoring and feedback control of gas flow rate, pressure, and temperature.

Equipped with fault alarm and diagnostic functions, supporting remote status monitoring.

High reliability industrial grade construction

Suitable for high-purity gas and corrosive gas environments, ensuring long-term stable operation.

Strictly comply with the semiconductor cleanroom usage standards (Class 1 or higher).

Flexible adaptability

Different channel quantities, valve configurations, and interface specifications can be customized according to process requirements.

Compatible with AMAT's various series of chambers and gas supply systems (such as Centura, Endura, P5000, etc.).

AMAT Applied Materials   0100-03320   Product imag

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