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  • AMAT Applied Materials 0190-11570 RF Matcher
  • AMAT Applied Materials 0190-11570 RF Matcher
AMAT Applied Materials 0190-11570 RF Matcher AMAT Applied Materials 0190-11570 RF Matcher

AMAT Applied Materials 0190-11570 RF Matcher

AMAT Applied Materials 0190-11570 RF Matcher

Product Details Introduction

Product Overview

The AMAT Applied Materials 0190-11570 RF Matching Network is a key RF subsystem used in semiconductor process equipment such as plasma etching, chemical vapor deposition, etc. Its main function is to match the impedance between the RF power output and the plasma load, thereby maximizing power transmission efficiency, reducing reflected power, and maintaining stable plasma operation. This module is usually used in conjunction with an RF power supply and is an important component of the AMAT machine process chamber.

Technical parameters (common characteristics, specific values may vary depending on version)

Operating frequency: Typically 13.56 MHz or multi frequency RF systems (may support secondary frequencies of 2 MHz, 27 MHz, etc.).

Power Range: Typically supports RF power transmission ranging from several hundred watts to several kilowatts.

Impedance matching range: It can be dynamically adjusted to match the impedance of the cavity load (usually 50 Ω standard).

Control mode: automatic matching (built-in control circuit) or controlled by an external main control system.

Interface: RF input/output coaxial connector, control signals are transmitted through a backplane or independent interface.

Cooling method: Some models may use air or water cooling to ensure long-term stable operation.

Version revision: 0190-11570 may have different revisions (Rev A, Rev B, etc.), with adjustments made to circuit parameters, control interfaces, or power levels.

Application scenarios

Plasma etching system: Provides stable RF power to the cavity plasma, maintaining etching rate and uniformity.

Chemical Vapor Deposition (CVD): Ensure plasma uniformity during the deposition process and improve film quality.

Ion implantation and ashing process: In process modules that require RF plasma, power matching is provided to ensure stable discharge.

AMAT equipment platform: a specific machine series designed for Applied Materials, used in conjunction with its RF power supply and chamber system.

AMAT Applied Materials 0190-11570  Product imag

applied_materials_0190-11570_rf_match_2mhz_fixed_2_5kw_hart_200mm_amat_2.jpg

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