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  • AMAT Applied Materials 0190-34229 Flow Controller
  • AMAT Applied Materials 0190-34229 Flow Controller
  • AMAT Applied Materials 0190-34229 Flow Controller
AMAT Applied Materials 0190-34229 Flow Controller AMAT Applied Materials 0190-34229 Flow Controller AMAT Applied Materials 0190-34229 Flow Controller

AMAT Applied Materials 0190-34229 Flow Controller

AMAT Applied Materials 0190-34229 Flow Controller

Product Details Introduction

Product Overview

The AMAT 0190-34229 flow controller is a key module used in Applied Materials semiconductor process equipment for precise control of gas flow. It is commonly used in chemical vapor deposition (CVD), physical vapor deposition (PVD), etching (Etch) and other processes to precisely adjust the flow rate of process gases to ensure stable process parameters and consistent process quality.

Technical parameters (typical features)

Type: Mass Flow Controller (MFC)

Function: Accurately control gas flow and achieve closed-loop flow regulation

Flow range: usually from a few sccm to several thousand sccm (depending on process requirements)

Accuracy: High precision flow control (error usually ± 1%~± 2% FS)

Interface type: digital or analog input/output, can be linked with a controller or PLC

Control mode: closed-loop control, supporting real-time feedback adjustment

Work environment: cleanroom compatible, chemically resistant, and adaptable to semiconductor process conditions

Compatible devices: Various deposition, etching, and ion implantation equipment from Applied Materials

Application scenarios

Process gas flow control

Accurately adjust the flow rate of reaction gas or carrier gas to ensure process stability.

Semiconductor deposition and etching processes

Control the gas ratio and flow rate in CVD, PVD, or Etch processes to improve film uniformity and repeatability.

Process parameter monitoring

Real time collection of traffic data, feedback to the digital controller, to achieve closed-loop regulation.

Equipment maintenance and calibration

Support modular replacement and calibration to reduce downtime and ensure accuracy.

Product advantages

High precision control: Ensure stable gas flow, improve process consistency and yield.

Real time feedback: Quickly respond to control signals and achieve closed-loop regulation.

Strong reliability: corrosion resistance, high temperature resistance, suitable for semiconductor process environment.

Modular design: easy to disassemble, maintain, and upgrade, improving equipment availability.

Wide compatibility: compatible with various AMAT semiconductor devices and control systems.

AMAT Applied Materials 0190-34229 Flow Controller Product imag

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