AMAT Applied Materials 0190-48491 Adapter

AMAT Applied Materials  0190-48491 Adapter

Product Details Introduction

AMAT Applied Materials 0190-48491 Adapter (Ion Meter Component) Product Application Fields

1、 Product Overview

AMAT Applied Materials 0190-48491 is a Dual Filament Hot Ion Gauge component commonly used as a pressure sensing sensor in vacuum systems.

This component is capable of measuring pressure ranging from high vacuum to ultra-high vacuum, and is commonly used in vacuum monitoring and feedback control systems for semiconductor process equipment.

It belongs to the core vacuum measurement and control component in AMAT (Applied Materials Company) equipment, especially used for high-density plasma (HDP) CVD and PVD process platforms, such as AMAT HDP100, Endura, Centura and other series.

2、 Technical characteristics

Type: Dual Filament Hot Cathode Ion Gauge

Measurement range: approximately 10 ⁻⁵ to 10 ⁻⁹ Torr

Output signal: 0.8-10 V analog voltage signal

Installation method: Standard vacuum flange interface (installed in conjunction with the vacuum system chamber)

Application features: high sensitivity, fast response speed, and long-term stable operation under harsh vacuum conditions

Often used in conjunction with vacuum controllers, power modules, and vacuum pump systems to form a closed-loop pressure control system

3、 Product application areas

Specific role of application field

Semiconductor manufacturing equipment is used to monitor the vacuum pressure in chambers such as CVD (chemical vapor deposition), PVD (physical vapor deposition), ALD (atomic layer deposition), etching, etc. Real time pressure detection is achieved through ionization principle to ensure stable operation of the process under set vacuum conditions.

During plasma processing, controlling the vacuum degree is a key parameter for maintaining ion energy and density in plasma reaction equipment. This ion meter can provide real-time feedback on the vacuum status of the chamber.

The ion implantation equipment maintains a stable high vacuum inside the implantation chamber to prevent ion beam scattering and improve implantation accuracy.

As vacuum monitoring sensors, vacuum pumps and system monitoring are used in conjunction with mechanical pumps, molecular pumps, turbo pumps, etc. to provide feedback on vacuum system pressure and ensure stable pump performance.

Equipment maintenance and calibration are used for system vacuum degree verification, sealing detection, leakage diagnosis, and equipment status assessment.

AMAT Applied Materials  0190-48491 Product imag

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