Novellus Systems 02-033134-00 Wafer Base Heater

Novellus Systems 02-033134-00 Wafer Base Heater 

 Introduction

Novellus Systems 02-033134-00 wafer base heater is an internal base heating component in the Novalis CVD process chamber, which carries wafers and provides the required substrate temperature conditions for the process.

Product Features

1. Partition type heating structure, small temperature difference control on the wafer surface, ensuring consistent film formation

2. Surface anti plasma corrosion coating, resistant to process gas erosion, reduces the risk of particle generation

3. Built in multiple temperature sensing components provide real-time feedback on the base temperature, facilitating closed-loop temperature control

4. Integrated RF grounding path, adapted to plasma chamber operating conditions, maintaining stable RF environment in the chamber

5. The overall modular base design allows for direct disassembly and assembly inside the cavity, reducing machine maintenance time

Product Specifications

1. Suitable for 8-inch wafer support, matching the internal dimensions of the corresponding process chamber

2. Integrated heating circuit and temperature detection circuit, driven by an external temperature control unit

3. Support continuous high-temperature operation inside the vacuum chamber and withstand plasma bombardment environment

4. Integrated vacuum sealed joint, realizing power and temperature measurement signal vacuum side lead out

5. Internal installation structure of the cavity, which can directly replace original spare parts

Application Areas

1. Novellus tungsten CVD thin film deposition process chamber

2. Base unit of semiconductor metal thin film deposition equipment

3. Vacuum plasma process wafer temperature control base

4. Chemical vapor deposition machine platform crystal circle bearing heating component

5. Replacement of spare parts for semiconductor production line cavity maintenance

The Novellus Systems 02-033134-00 wafer base heater directly determines the temperature environment of the wafer process and is the core base spare part of the thin film deposition chamber.

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