Introduction
AE 3152313-001B (MDX L12) DC power module, semiconductor process high-power DC bias power supply.
Product Features:
1. High precision DC closed-loop output, high voltage and current regulation accuracy
2. Low ripple output ensures the stability of plasma process
3. Support free switching between constant voltage and constant current working modes
4. Built in fast arc suppression to resist the impact of chamber ignition
5. The local display screen can view operating parameters and fault codes
6. Supports both analog and digital remote control, and interfaces with the entire PLC system
7. Modular structure of rack, convenient on-site disassembly and replacement
8. Intelligent temperature control and heat dissipation, 7 × 24-hour full load operation of the production line
9. Real time collection of power data, supporting process status monitoring
10. Resistant to sudden load changes, adaptable to various plasma loads such as etching and PVD
Product Parameters:
1. Rated power: 12kW
2. Working mode: Constant voltage, constant current programmable output
3. Control interface: analog I/O, digital communication interface
4. Protection functions: overvoltage, overcurrent, overtemperature, short circuit, arc protection
5. Equipment adaptation: Semiconductor etching, thin film deposition process platform
AE 3152313-001B is mainly used for DC bias power supply stations in PVD and etching equipment.
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