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  • GENESIS 27-406204-00 RF Generator
  • GENESIS 27-406204-00 RF Generator
  • GENESIS 27-406204-00 RF Generator
GENESIS 27-406204-00 RF Generator GENESIS 27-406204-00 RF Generator GENESIS 27-406204-00 RF Generator

GENESIS 27-406204-00 RF Generator

GENESIS 27-406204-00 RF Generator 

 Introduction

GENESIS 27-406204-00 RF generator, a specialized RF power supply for semiconductor plasma processes.

Product Features:

1. All solid state power architecture, fast and stable output power closed-loop

2. Can withstand high standing wave ratio, and is not easily shut down due to sudden load changes

3. Support dual control of local panel and remote upper computer

4. Strong harmonic suppression ability, reducing process interference

5. Equipped with arc detection function, quickly suppress plasma ignition

6. Built in multiple protections, capable of outputting alarm signals in case of faults

7. Supports analog and digital interfaces, compatible with semiconductor equipment PLC

8.19-inch standard rack mounted, easy to install and disassemble cabinet

9. Water cooling and heat dissipation design, low temperature rise during long-term full load operation

10. Real time monitoring of forward and reverse power for convenient process debugging

Product Parameters:

1. Operating frequency: 27.12MHz

2. Output power: maximum 4000W, adjustable from 0 to 4000W

3. Communication interface: Analog I/O, RS232 communication

4. Protection functions: over temperature, over current, over standing wave, arc, interlock protection

5. Cooling method: water-cooled cooling

GENESIS 27-406204-00 is commonly used in semiconductor plasma process stations such as etching and thin film deposition.

Product imag

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