MKS 0920-00057 plasma power module

MKS 0920-00057 plasma power module 

 Introduction

MKS 0920-00057 is equipped with an RF plasma power module for Astron's remote plasma source, providing RF excitation energy to the plasma chamber for semiconductor chamber cleaning processes.

Application areas

1. Dry cleaning of CVD chamber for semiconductor equipment

2. Removal and treatment of sediment in the etching machine chamber

3. Plasma ashing and stripping process for photoresist

4. Compound semiconductor wafer processing

5. Maintenance and cleaning of the chamber of thin film deposition equipment

6. Surface modification processing of low-k dielectric materials

7. Advanced chip packaging cavity purification operation

8. Cleaning process of photovoltaic thin film equipment chamber

9. Plasma dissociation treatment of process exhaust gas

10. Free radical excitation in nitrogen oxidation process

Product Parameters

1. Pulse RF output mode, compatible with NF3 process gas, maximum flow rate of 6SLM

2. Closed loop power control, stable output power, and good process repeatability

3. Water cooling and heat dissipation structure, supporting long-term continuous production and operation of equipment

4. Equipped with digital bus and analog I/O, interface with semiconductor equipment master control

5. Built in overcurrent, over temperature, and reflection power over limit fault protection

Overall, the MKS 0920-00057 power module has stable output and is compatible with remote plasma sources, making it the core power supply unit for semiconductor cavity cleaning processes.

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