TMP-H3603LMC-A1 Turbomolecular Pump

TMP-H3603LMC-A1 Turbomolecular Pump 

 Introduction

Shimadzu TMP H3603LMC A1 is a Shimadzu magnetic levitation turbo molecular pump, water-cooled, with high pumping speed, suitable for semiconductor corrosive process gases, and achieves ultra-high clean vacuum.

Application areas

1. High vacuum pumping of semiconductor dry etching chamber

2. PVD metal film deposition equipment vacuum main pump

3. Vacuum maintenance of ion implantation machine process chamber

4. Vacuum system for compound semiconductor wafer manufacturing process

5. Load lock chamber with high flow and fast vacuum extraction

6. Semiconductor etching halogen corrosion gas working condition exhaust

7. Electron beam detection equipment with ultra-high vacuum chamber

8. Advanced packaging technology vacuum equipment unit

9. Research space simulation cabin vacuum system

10. Vacuum pumping unit for optical large-scale vacuum coating equipment

Product Parameters

1. Magnetic levitation bearing structure, contactless, extremely low vibration, with a total weight of 75kg

2. Rated speed of 24000rpm, water-cooled heat dissipation, supporting 7 × 24-hour continuous operation

3. Equipped with a blowing gas interface, it can withstand halogen corrosion process gases and reduce rotor corrosion losses

4. External drive control, digital communication, remote monitoring of speed, temperature, and vibration

5. Built in multiple protections for overspeed, overheating, vibration exceeding limits, and fault alarms

Overall, Shimadzu TMP-H3603LMC-A1 has strong pumping capability, process corrosion resistance, and stable operation, making it the core pumping component of large vacuum chambers in semiconductor process equipment

Product imag

ontroller Module

DI3201 DI3201-A-V001 Digital input module
DO3201 DO3201-A-V001 pulse output card
DO810 3BSE008510R1 Control module

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