Edwards STP-XA3203CV Turbomolecular Pump
Introduction
#Edwards STP-XA3203CV Turbomolecular Pump Product Features
Edwards STP-XA3203CV semiconductor magnetic levitation turbo molecular pump, suitable for weight corrosion plasma process, with the following characteristics:
1. Five axis fully magnetic levitation bearing, rotor non-contact, no risk of grease contamination
2. Equipped with TMS temperature control management system to suppress the condensation and deposition of process by-products
3. High pumping speed output, outstanding performance in processing hydrogen and argon gas
4. Tolerate high process flow and adapt to various exhaust load conditions during etching
5. Built in adaptive damping algorithm, the overall vibration level of the machine is extremely low
6. Special anti-corrosion pump body configuration, compatible with halogen corrosive gases
7. Water cooled cooling structure, temperature controllable during long-term heavy load operation
8. Comes with a nitrogen purge interface to protect bearing components from process gas erosion
9. Can be installed in multiple positions, not limited by the installation angle of the device
10. Onboard drive control unit, reducing external controller wiring
11. Real time status monitoring, capable of recording complete operation and fault data
12. Industrial communication interface, which can be connected to the main control of the production line to achieve remote control
13. Equipped with multiple interlocking protections for overcurrent, overheating, and rotor abnormalities
14. Meet SEMI industry standards and adapt to 300mm wafer equipment cavities
15. Wear free bearing design reduces on-site maintenance frequency
Edwards STP-XA3203CV turbo molecular pump, resistant to deposition and low vibration, suitable for high vacuum processes such as semiconductor etching and ion implantation.
Product imag

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| PCE835-XYZ-A | MC-TAIH62 | |
| PCE835-001-T | MC-PDOY22 80363975-150 | |
| PCE835-001-N | MC-PD1X02 | |
| PCE833-001-T | MC-TAIL02 | |
| PCE833-001-N | MC-TAIL12 |