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  • Edwards STP-XA3203CV Turbomolecular Pump
  • Edwards STP-XA3203CV Turbomolecular Pump
  • Edwards STP-XA3203CV Turbomolecular Pump
Edwards STP-XA3203CV Turbomolecular Pump Edwards STP-XA3203CV Turbomolecular Pump Edwards STP-XA3203CV Turbomolecular Pump

Edwards STP-XA3203CV Turbomolecular Pump

Edwards STP-XA3203CV Turbomolecular Pump 

 Introduction

#Edwards STP-XA3203CV Turbomolecular Pump Product Features

Edwards STP-XA3203CV semiconductor magnetic levitation turbo molecular pump, suitable for weight corrosion plasma process, with the following characteristics:

1. Five axis fully magnetic levitation bearing, rotor non-contact, no risk of grease contamination

2. Equipped with TMS temperature control management system to suppress the condensation and deposition of process by-products

3. High pumping speed output, outstanding performance in processing hydrogen and argon gas

4. Tolerate high process flow and adapt to various exhaust load conditions during etching

5. Built in adaptive damping algorithm, the overall vibration level of the machine is extremely low

6. Special anti-corrosion pump body configuration, compatible with halogen corrosive gases

7. Water cooled cooling structure, temperature controllable during long-term heavy load operation

8. Comes with a nitrogen purge interface to protect bearing components from process gas erosion

9. Can be installed in multiple positions, not limited by the installation angle of the device

10. Onboard drive control unit, reducing external controller wiring

11. Real time status monitoring, capable of recording complete operation and fault data

12. Industrial communication interface, which can be connected to the main control of the production line to achieve remote control

13. Equipped with multiple interlocking protections for overcurrent, overheating, and rotor abnormalities

14. Meet SEMI industry standards and adapt to 300mm wafer equipment cavities

15. Wear free bearing design reduces on-site maintenance frequency

Edwards STP-XA3203CV turbo molecular pump, resistant to deposition and low vibration, suitable for high vacuum processes such as semiconductor etching and ion implantation.

Product imag

STP-XA3203CV.webp (2).jpg


ontroller Module

Honeywell SC-UCMX01 51307198-175 module
Honeywell SC-UCMX01 51307195-175 module
IDPG 940128102 Control card

Other website links

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PCE835-XYZ-N6SC6100-0GE01MC-TAIH53
PCE835-XYZ-A6SC6101-3B-ZMC-TAIH62
PCE835-001-T6SC9711-0BM0MC-PDOY22 80363975-150
PCE835-001-N6SC6101-4A-ZMC-PD1X02
PCE833-001-TGESPAC PIA-2AMC-TAIL02
PCE833-001-N6SC6101-2A-ZMC-TAIL12


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