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  • GHW55A-13DF4L0-002 RF Generator
  • GHW55A-13DF4L0-002 RF Generator
  • GHW55A-13DF4L0-002 RF Generator
GHW55A-13DF4L0-002 RF Generator GHW55A-13DF4L0-002 RF Generator GHW55A-13DF4L0-002 RF Generator

GHW55A-13DF4L0-002 RF Generator

GHW55A-13DF4L0-002 RF Generator 

 Introduction

#GHW55A-13DF4L0-002 RF Generator Product Features

GHW55A-13DF4L0-002 semiconductor RF generator, used for plasma process power supply, with the following characteristics:

1. 13.56MHz operating frequency, rated 5500W high-power output

2. Closed loop power control, stable output, and good process consistency

3. Adapt to load impedance fluctuations and ensure that the output is not easily interrupted due to changes in cavity operating conditions

4. Good harmonic suppression to reduce electromagnetic interference of radio frequency on equipment

5. High overall conversion efficiency, reducing energy consumption and equipment heating

6. Water cooling and heat dissipation, supporting 7 × 24-hour high-power continuous operation

7. Real time monitoring of incident and reflected power, fast ignition protection for power amplifiers

8. The panel can directly view the operating status such as power and alarms

9. Supports both local and remote control modes for easy debugging

10. The communication interface can be connected to the device controller to achieve automated control

11. Save fault history records for easy on-site troubleshooting

12. Multiple safety protections including over temperature, over current, and over reflection

13. 19 inch standard rack, cabinet installation takes up less space

14. Compatible with factory three-phase industrial power supply, compatible with 50/60Hz

15. Modular power components, fast replacement of spare parts, and reduced downtime

GHW55A-13DF4L0-002 RF generator, with sufficient power and disturbance resistance, suitable for etching and thin film deposition semiconductor mass production processes.

Product imag

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