Edwards NRY4JC000XS vacuum pump

Edwards NRY4JC000XS vacuum pump   

 Introduction

#Edwards NRY4JC000XS Vacuum Pump Product Features

Edwards NRY4JC000XS dry vacuum pump, designed for exhaust use in semiconductor processes, features the following:

1. Fully dry oil-free structure to avoid oil mist pollution of the process chamber

2. Anti corrosion treatment of pump chamber, capable of suctioning corrosive process gases

3. Configure multiple nitrogen purging channels to suppress dust accumulation

4. Driven by a variable frequency motor, it automatically adjusts speed and saves energy according to the load

5. Extreme vacuum stability, capable of long-term continuous heavy load operation

6. Water cooling and heat dissipation design, controllable temperature rise under high temperature conditions

7. The extraction flow rate is stable and suitable for exhaust in various processes

8. Built in fault self check, quickly output alarm information

9. Equipped with communication interface, supporting remote monitoring by upper computer

10. Equipped with anti backflow protection to prevent gas from flowing back into the chamber

11. Compact overall structure, saving equipment installation space

12. Low operating vibration, suitable for clean workshop environment

13. Meet SEMI related semiconductor safety standards

14. Direct extraction at atmospheric pressure, without the need for additional front-end pumps

15. Modular components, easy to disassemble and maintain

Edwards NRY4JC000XS vacuum pump is corrosion-resistant, reliable, and low maintenance, suitable for semiconductor etching and thin film deposition vacuum conditions.

Product imag

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PCE835-XYZ-N	6SC6100-0GE01	MC-TAIH53
PCE835-XYZ-A	6SC6101-3B-Z	MC-TAIH62
PCE835-001-T	6SC9711-0BM0	MC-PDOY22 80363975-150
PCE835-001-N	6SC6101-4A-Z	MC-PD1X02
PCE833-001-T	GESPAC PIA-2A	MC-TAIL02
PCE833-001-N	6SC6101-2A-Z	MC-TAIL12