AMAT Applied Materials 0090-01419 RF Generator

AMAT Applied Materials  0090-01419 RF Generator

Product Details Introduction

AMAT Applied Materials 0090-01419 RF Generator

1、 Product Overview

AMAT 0090-01419 is a radio frequency (RF) power generation module used by Applied Materials for semiconductor equipment, primarily for plasma process control.

This RF generator can convert DC or low-frequency power into high-frequency RF signals, providing stable plasma energy for processes such as PVD (Physical Vapor Deposition), CVD (Chemical Vapor Deposition), Etch (Etch), etc.

This module is typically used in conjunction with an RF Matching Network to achieve impedance matching of the plasma chamber and improve energy transfer efficiency.

2、 Product Features

RF power output

Generate high-frequency electromagnetic signals (commonly 13.56 MHz or 2 MHz) to drive the plasma in the process chamber.

The output power is adjustable and supports the energy requirements of different process stages.

Automatic impedance matching support

Collaborate with matching networks to reduce reflected power and improve RF energy transmission efficiency.

Adapt to changes in chamber load and achieve stable plasma state.

Real time monitoring and protection

Built in overcurrent, overvoltage, overtemperature, and reflected power protection.

Provide status feedback, communicate with the device control system, and achieve remote monitoring.

Integration with process systems

Compatible with AMAT Endura, Centura, Producer and other systems.

Support modular installation for easy maintenance and replacement.

AMAT Applied Materials  0090-01419  Product imag

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