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  • AMAT Applied Materials 0010-26029 Power Matching Components
  • AMAT Applied Materials 0010-26029 Power Matching Components
  • AMAT Applied Materials 0010-26029 Power Matching Components
AMAT Applied Materials 0010-26029 Power Matching Components AMAT Applied Materials 0010-26029 Power Matching Components AMAT Applied Materials 0010-26029 Power Matching Components

AMAT Applied Materials 0010-26029 Power Matching Components

AMAT Applied Materials 0010-26029 Power Matching Components

Product Details Introduction

AMAT Applied Materials 0010-26029 Power Matching Components

1、 Product Overview

AMAT 0010-26029 is an RF Power Matching Network Assembly used by Applied Materials for semiconductor equipment.

The main function of this component is to match the impedance between the radio frequency (RF) power supply and the plasma chamber in real-time, in order to maximize energy transfer efficiency and stabilize the plasma state.

It is commonly used in vacuum process chambers such as PVD, CVD, ETCH, ALD, and is an indispensable high-frequency power control module in AMAT vacuum processing systems.

2、 Product Features

Automatic impedance matching function

Real time monitoring of load changes (such as gas types inside the cavity, plasma density, process stage changes) and automatic adjustment of the matching network.

Realize efficient energy transfer from the power supply to the cavity and reduce reflected power.

High reliability and stability design

Using high-voltage capacitors and high-frequency inductors to ensure long-term operation under high-power RF conditions.

Has good thermal stability and is suitable for 24/7 continuous production environment.

Modular structure

Modular design facilitates installation and replacement, and can be quickly maintained or upgraded.

Compatible with AMAT's various series of RF power modules (such as ENI, AE, Comdel).

High precision matching response

Fast matching speed (usually<100 milliseconds), meeting the requirements for quick switching of process steps.

Ensure the uniformity of ion density and energy distribution in the process, and improve the consistency of film deposition or etching.

Built in safety protection circuit

Equipped with overvoltage, overcurrent, and overheating protection functions to prevent damage to the RF power supply or cavity caused by abnormal reflection.

Provide feedback signals for system control and status monitoring.

Compatible with multiple AMAT process platforms

Suitable for Endura, Centura, Producer, P5000 and other series of devices.

Can be matched with RF power systems of different power levels (13.56 MHz, 2 MHz, and other frequency bands).

AMAT Applied Materials 0010-26029 Product imag

applied_materials_0010-26029_0035-00176_match_assembly_2_mhz_ice_300mm_amat.jpg

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