AMAT Applied Materials 0010-08670 Top Cover

AMAT Applied Materials 0010-08670 Top Cover

Product Details Introduction

AMAT Applied Materials 0010-08670 Top Cover

Product Overview

0010-08670 is a top cover/Chamber Lid component in AMAT semiconductor equipment, mainly used to seal process chambers or critical modules, ensuring safe operation of the equipment under vacuum or controlled atmosphere conditions. The top cover not only provides mechanical protection, but also typically integrates sealing, interface, and monitoring functions, making it an important component for ensuring process stability and equipment safety.

Technical functions and features

Sealing and Vacuum Maintenance

The top cover is equipped with high-performance seals to ensure the vacuum integrity of the cavity or process module.

Prevent external air or impurities from entering and ensure a pure process environment.

mechanical protection

Protect the wafers and precision components inside the cavity from mechanical damage.

The structure is sturdy and can withstand vacuum differences and equipment operation vibrations.

Interface and sensor installation

The top cover is usually designed with interfaces that can accommodate gas pipelines, electrical connections, or sensors.

Support temperature, pressure, or position monitoring to achieve closed-loop process control.

Security interlock design

The top cover is linked with the device controller to prevent the device from starting when it is not fully closed or sealed abnormally.

Protect the safety of wafers and equipment to avoid damage caused by misoperation.

modular design

The structure is detachable and replaceable, making it easy to maintain and upgrade the equipment.

Designed to meet semiconductor cleanroom standards, easy to clean and maintain.

Application field

CVD/PVD process chamber

Used to seal deposition or sputtering chambers, maintain vacuum and gas purity environment.

Etching equipment

The top cover serves as a mechanical sealing component of the cavity, ensuring precise control of plasma or reactive gases.

Wafer Handling and Loadlock System

The top cover cooperates with the elevator and pneumatic module to achieve safe entry and exit of wafers into the cavity.

High cleanliness automated production line

Maintain the cleanliness inside the equipment to prevent particle contamination from affecting process quality.

AMAT Applied Materials 0010-08670 Top Cover Product imag

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