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  • AMAT Applied Materials 0090-06421 Controller
  • AMAT Applied Materials 0090-06421 Controller
  • AMAT Applied Materials 0090-06421 Controller
AMAT Applied Materials 0090-06421 Controller AMAT Applied Materials 0090-06421 Controller AMAT Applied Materials 0090-06421 Controller

AMAT Applied Materials 0090-06421 Controller

AMAT Applied Materials 0090-06421 Controller

Product Details Introduction

AMAT Applied Materials 0090-06421 Controller

Product Overview

0090-06421 is a controller unit in AMAT semiconductor process equipment, used to manage and coordinate key process subsystems of the equipment. This controller is responsible for collecting sensor data, executing process logic, controlling actuator actions, and communicating with the upper control system to achieve precise control of process parameters and process safety protection.

Technical functions and features

Multi channel signal acquisition and processing

Receive signals from gas panels, vacuum pumps, heaters, sensors, and actuators.

Perform logical processing and data analysis on signals to ensure the accuracy of process operations.

Execution and Control Capability

Send control commands to valves, pumps, heaters, power modules, etc.

Support automated process operations and formula switching to improve process reproducibility.

Safety and interlock function

Built in interlock logic to prevent critical actions from being executed in abnormal states.

Integrate with temperature, pressure, access control, and power protection systems to enhance equipment safety.

communication interface

Support communication with the upper PLC or factory automation system to achieve remote monitoring and data collection.

Provide standard interfaces that are compatible with other AMAT control and I/O modules.

modular design

Support quick installation, disassembly, and replacement for easy equipment maintenance.

Designed to meet the semiconductor cleanroom environment and adapt to long-term continuous operation.

Application field

CVD/PVD thin film deposition equipment

Control gas flow rate, chamber pressure, power supply, and heater to ensure uniform and stable film deposition.

Etching equipment

Manage the plasma source, temperature control, and gas path system to ensure etching rate and selectivity.

Cleaning and surface treatment equipment

Control the flow rate, temperature, and handling system of chemical liquids to improve cleaning efficiency.

Wafer Handling and Loadlock System

Coordinate elevators, cabin doors, and handling robots to ensure the safe movement of wafers.

Semiconductor automation production line

Integrate multiple module control to achieve automatic monitoring of process parameters, data recording, and production process optimization.

AMAT Applied Materials 0090-06421 Controller Product imag

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