AMAT Applied Materials 0190-39331 Controller Module

AMAT Applied Materials 0190-39331 Controller Module

Product Details Introduction

Product Overview

The AMAT 0190-39331 controller module is a core control component in semiconductor manufacturing equipment, used to manage the operation signals of various actuators and sensors in the process. This module can coordinate gas, liquid, and motion control systems to ensure the accuracy and stability of equipment in various process steps.

Product application areas

Chemical Vapor Deposition (CVD) System

Control the flow rate of reaction gas and chamber pressure to ensure the uniformity of thin film deposition and process repeatability.

Coordinate heating, cooling, and gas switching to achieve high-quality thin film preparation.

Physical Vapor Deposition (PVD) System

Manage the gas flow rate and vacuum pressure during the deposition process of metal target materials.

Support simultaneous control of multiple chambers and processes to improve production efficiency.

Chemical Mechanical Polishing (CMP) System

Control the flow rate and pressure of polishing solution and auxiliary liquid to ensure the accuracy of wafer surface planarization.

Coordinate liquid pumps and valves to achieve dynamic flow regulation and optimize process efficiency.

Etch system

Accurately control the flow rate of etching gas, chamber pressure, and temperature.

Coordinate with the main control system and vacuum pump to achieve high selectivity and precision etching.

Ion implantation system

Adjust gas flow rate and pressure to ensure ion beam uniformity.

Monitor and feedback control equipment modules to ensure stable injection dose and depth.

Other semiconductor process systems

Suitable for various precision fluid control and automation control systems.

It can be used in conjunction with temperature control modules, interface modules, and servo drives to achieve a complete process control solution.

AMAT Applied Materials 0190-39331 Controller Module Product imag

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