AMAT Applied Materials 0010-09416 RF Matching Component

AMAT Applied Materials 0010-09416 RF Matching Component

Product Details Introduction

Product Overview

AMAT 0010-09416 RF Matching Network Assembly is a key RF subsystem module in Applied Materials' semiconductor equipment. Its main function is to match the impedance between the RF power supply and the process chamber in real time, thereby ensuring efficient transmission of RF energy to the plasma, improving the stability and uniformity of the plasma, and widely used in plasma process equipment such as etching (Etch), CVD, PVD, etc.

Technical parameters (typical features)

Module type: RF Matching Network

Main functions: automatic matching of RF impedance, optimization of energy transmission

Frequency range: commonly used for semiconductor industry standard frequencies such as 13.56 MHz and 27 MHz

Power processing capability: capable of withstanding RF power ranging from several hundred watts to several thousand watts (depending on device configuration)

Control mode: Supports automatic tuning and real-time feedback to ensure the stability of the cavity process

Compatible equipment: Applied Materials plasma etching machine, PVD/CVD deposition equipment

Application scenarios

Plasma etching process

Maintain stable plasma during silicon wafer etching to ensure uniform etching depth and morphology.

Thin film deposition (PVD, CVD)

Maintain stable power transmission during the sedimentation process, and improve the thickness and composition uniformity of the film layer.

Ion implantation and surface treatment

Control ion energy and distribution to ensure consistency in injection dose and surface modification.

Process yield improvement

Reduce deviation and decrease process defect rate through precise RF control.

AMAT Applied Materials 0010-09416 RF Matching Component Product imag

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