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  • HUTTINGER PFM1500A RF Generator
  • HUTTINGER PFM1500A RF Generator
  • HUTTINGER PFM1500A RF Generator
HUTTINGER PFM1500A RF Generator HUTTINGER PFM1500A RF Generator HUTTINGER PFM1500A RF Generator

HUTTINGER PFM1500A RF Generator

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  • Delivery date: stock
  • The quality assurance period: 365 days
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  • Email:stodcdcs@gmail.com
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HUTTINGER PFM1500A RF Generator

Product Details Introduction

HUTTINGER PFM1500A RF Generator

Product Overview

Huttinger PFM1500A is a high-performance RF generator widely used in semiconductor, photovoltaic, display panel, and vacuum process equipment. This device is capable of outputting stable RF power in the standard RF frequency band (13.56 MHz) and achieving efficient energy transmission in conjunction with a matching network.

Model: PFM1500A

Output power: 1500 W

Operating frequency: 13.56 MHz (industrial standard frequency band)

Power input: 230 V

Output interface: Standard 50 Ω coaxial interface

Technical Features

High power output: Supports 1500 W level continuous RF power output to meet the requirements of high-energy density processes.

Stable frequency: fixed at 13.56 MHz, in line with international standard RF frequency band, suitable for various plasma processes.

Automatic impedance matching: works in conjunction with the matching network to achieve impedance matching between the plasma load and the power supply, reducing reflected power.

Efficient heat dissipation design: The internally optimized heat dissipation system ensures long-term stable operation.

Remote/Local Control: Supports local panel control or external interface remote control, making it easy to integrate into automated process equipment.

Application field

Semiconductor Manufacturing

Used for plasma etching, ion implantation, and CVD/PVD thin film deposition.

photovoltaic industry

Provide radio frequency plasma excitation in the thin film coating process of solar cells.

display panel

Applied to thin film deposition and processing of large-area glass substrates in TFT-LCD and OLED processes.

Vacuum Coating and Material Surface Treatment

Used for the preparation of optical films, hard coatings, and functional films.

Research Experiment Platform

As a stable RF energy source in materials science and plasma physics experiments.

Product imag

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