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  • Huttinger TIG10/100 Jet Plasma Control Panel
  • Huttinger TIG10/100 Jet Plasma Control Panel
  • Huttinger TIG10/100 Jet Plasma Control Panel
Huttinger TIG10/100 Jet Plasma Control Panel Huttinger TIG10/100 Jet Plasma Control Panel Huttinger TIG10/100 Jet Plasma Control Panel

Huttinger TIG10/100 Jet Plasma Control Panel

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  • Delivery date: stock
  • The quality assurance period: 365 days
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Huttinger TIG10/100 Jet Plasma Control Panel

Product Details Introduction

Huttinger TIG 10/100 Spray Plasma Control Panel

Product Overview

Huttinger TIG 10/100 is a specialized control panel for jet (sputtering) plasma systems, mainly used for power management and process control of plasma generation and operation in a vacuum environment. Its design balances stability and accuracy, ensuring the controllability of plasma states in processes such as thin film deposition.

Model: TIG 10/100

Manufacturer: Huttinger Elektronik

Voltage specification: 208V

Equipment dimensions: approximately 15 inches wide, 10 inches high, and 30 inches deep

Weight: Approximately 15 pounds

Technical Features

High stability power control: Provides continuous and stable energy output in the sputtering process, avoiding plasma non-uniformity or fluctuations.

Precise process adjustment: By adjusting the parameters on the control panel, the plasma power and process conditions can be optimized.

Industrial grade design: Suitable for long-term operation of vacuum coating and semiconductor process equipment.

Strong compatibility: It can be integrated with various vacuum sputtering equipment and supports process expansion and upgrading.

Application field

Semiconductor Manufacturing

Thin film deposition and etching for integrated circuit and wafer processes.

photovoltaic industry

Used in the coating process of solar cell production to enhance the performance of solar cells.

Flat panel display manufacturing

Applied to large-area glass substrate processing for display panels such as TFT-LCD and OLED.

Optical Coating

Used for high-precision thin film deposition in the production of optical components (lenses, filters).

Scientific research experiment

Used for materials science, plasma technology research and experimental platforms.

Product imag

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