Advanced Energy 27-368299-00 RF Generator

Advanced Energy 27-368299-00 RF Generator 

 Introduction

Advanced Energy 27-368299-00 is a semiconductor equipment matching RF generator that outputs stable RF power for plasma process excitation.

Application areas

1. Plasma excitation in semiconductor dielectric etching process

2. RF power supply for PECVD thin film deposition equipment

3. Remote plasma source chamber cleaning power supply

4. Compound semiconductor wafer processing

5. Chip dry de gluing and ashing process

6. Preparation and processing of low-k dielectric thin films

7. Atomic layer deposition ALD process power supply

8. Photovoltaic thin film plasma treatment process

9. Vacuum PVD coating plasma excitation

10. Maintenance and cleaning of semiconductor process chambers

Product Parameters

1. Standard 13.56MHz RF output, power continuously adjustable

2. Three phase AC208V industrial power supply, suitable for semiconductor cabinet working conditions

3. Equipped with pulse modulation function and fast arc suppression protection

4. Supports Ethernet, analog I/O, and interfaces with device control systems

5. Water cooling and heat dissipation, with built-in protection against overheating, overcurrent, and reflected power

Overall, Advanced Energy 27-368299-00 has stable and reliable RF output, making it the core power supply unit for semiconductor plasma processes

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