MKS AX7700MTS-03 plasma source

MKS AX7700MTS-03 plasma source 

 Introduction

MKS AX7700MTS-03 is a remote microwave plasma source used for semiconductor cavity cleaning and active radical generation.

Application areas

1. Dry cleaning of semiconductor deposition process chamber

2. Free radical supply for nitride and oxide film processes

3. Removal of photoresist by ashing treatment

4. Removal of sediment from the etching equipment chamber

5. Compound semiconductor wafer processing technology

6. Cleaning and maintenance of photovoltaic film equipment chamber

7. Surface modification of low-k dielectric materials

8. Atomic layer process with plasma treatment

9. Treatment of special gas dissociation waste gas

10. Advanced packaging equipment cavity purification

Product Parameters

1. Microwave excitation method, high gas dissociation efficiency, reaching over 95%

2. Support the operation of various process gases such as NF3, O2, N2, etc

3. Water cooling and heat dissipation design, capable of long-term continuous production and operation

4. Equipped with EtherCAT and analog I/O industrial communication interface

5. Corrosion resistant PEO coating cavity, low particle pollution output

In summary, the MKS AX7700MTS-03 plasma source has high dissociation efficiency and good cleanliness, making it a key component for cleaning the cavity of semiconductor thin film equipment

Product imag

ontroller Module

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