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  • HUTTINGER 1397547-01-361248 Control Generator Module
  • HUTTINGER 1397547-01-361248 Control Generator Module
  • HUTTINGER 1397547-01-361248 Control Generator Module
HUTTINGER 1397547-01-361248 Control Generator Module HUTTINGER 1397547-01-361248 Control Generator Module HUTTINGER 1397547-01-361248 Control Generator Module

HUTTINGER 1397547-01-361248 Control Generator Module

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HUTTINGER 1397547-01-361248 Control Generator Module

Product Details Introduction

HUTTINGER 1397547-01-361248 Control Generator Module

Product Overview

Huttinger 1397547-01-361248 is an industrial grade control generator module primarily used in high-precision RF or plasma process systems. This module is used to control and regulate the output of the generator, achieve stable and efficient power supply, and ensure good matching with loads such as plasma chambers or power amplifiers.

Model: 1397547-01-361248

Type: Control Generator Module

Function: Control and regulate generator output to ensure stable power supply and load matching

Industrial applications: semiconductor manufacturing, thin film deposition, vacuum plasma treatment

Technical Features

High precision control: precise control of the generator output voltage, current, and power through the internal circuit of the module.

Strong stability: Suitable for industrial processes that operate for long periods of time, ensuring stable RF or DC output.

Good compatibility: Can be used in conjunction with various HUTTINGER generators, power amplifiers, and matching networks.

Complete protection function: It has overcurrent, overvoltage, and short-circuit protection, improving system safety.

Modular design: easy to replace, maintain, and upgrade, suitable for industrial production lines and scientific research equipment.

Application field

Semiconductor Manufacturing

Used for RF or DC power generation control in plasma etching, sputtering deposition, and ion implantation processes.

Thin film deposition and surface treatment

Provide stable power support in PVD/CVD, optical coating, and industrial coating processes.

Vacuum plasma process

Control the power of the plasma source to achieve precise plasma excitation and process optimization.

Scientific research experiment

Used as a generator output control module in materials science and plasma physics experiments.

industrial manufacturing

Applied to surface modification, functional film processing, and other processes that require high stability power supply.

Product imag

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