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AMAT 0190-51379 Generator

Classify:Industry news |Time:2025-09-11 14:10:40

AMAT 0190-51379 Generator

Product Details Introduction

AMAT 0190-51379 Generator

Product application areas

Semiconductor Manufacturing Equipment

As a critical power component in Applied Materials equipment, it is used to provide stable energy support.

Applied to processes such as plasma etching machines, deposition machines, ion implantation machines, etc., to ensure the continuity and stability of the process.

Vacuum process system

Provide power to plasma sources or high-frequency power modules in a vacuum environment.

Widely used in processes such as thin film deposition (PVD/CVD), surface treatment, and thin film etching.

Photovoltaic and display panel manufacturing

Used in photovoltaic cell production equipment to provide the energy required for plasma excitation.

Support large-area glass substrate processing technology in TFT-LCD and OLED panel manufacturing processes.

Industrial plasma applications

Applied to precision material processing, such as coating, etching, hardening treatment, etc.

As the core power supply unit in plasma processes that require high-frequency and stable power supply.

Research and Experimental Platform

Deploy in high-end laboratories and R&D platforms for testing and validating semiconductor and new material processes.

Provide stable experimental process conditions to ensure the accuracy of experimental data.

Product imag

amat_applied_materials_0190-51379_rfg_plasma_generator_ssm_3000_trumpf_huttinger_5.jpg

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PMB33E-10100-00BC101157160001-GF DSDP 150
PMB33E-00216-0370 SK 34b-E57120001-PX DSTA 001


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