MKS AX7700-10 Remote Plasma Source

MKS AX7700-10 Remote Plasma Source 

 Introduction

The MKS AX7700-10 is a Paragon ring remote plasma source that generates neutral active free radicals for semiconductor cavity cleaning and process processing.

Application areas

1. Dry cleaning of semiconductor CVD deposition chamber

2. Removal of sediment from etching equipment chamber

3. Plasma ashing and stripping of photoresist

4. Compound semiconductor wafer processing technology

5. Maintenance and cleaning of the chamber of thin film process equipment

6. Surface modification treatment of low-k dielectric materials

7. Advanced chip packaging cavity purification

8. Cleaning of photovoltaic thin film deposition equipment chamber

9. Plasma dissociation treatment of process exhaust gas

10. Free radical supply for nitrogen oxidation process

Product Parameters

1. Circular plasma structure, gas dissociation efficiency greater than 95%

2. Compatible with various process gases including NF3, O2, N2, and H2

3. Three phase 200-208V power supply, water-cooled circulation heat dissipation

4. Configure EtherCAT and analog I/O industrial communication interface

5. PEO corrosion-resistant coating chamber, low particle pollution output

Overall, the MKS AX7700-10 plasma source has high dissociation efficiency and stable operation, making it the core component for cavity cleaning of semiconductor thin film equipment

Product imag

ontroller Module

BENTLY 135489-03 Monitor module
3BHB003688R0001 pulse output card
GE 705-1512-01 Automatic card

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