Edwards EUV3050H vacuum dry pump

Edwards EUV3050H vacuum dry pump 

 Introduction

The Edwards EUV3050H vacuum dry pump is a specialized oil-free dry pump for EUV lithography equipment, responsible for pumping and discharging high flow hydrogen gas from the chamber. The core product features are as follows:

1. Fully dry oil-free structure to prevent oil vapor pollution of the chamber

2. High pumping speed design, suitable for EUV high flow hydrogen working conditions

3. Special gas path coating, resistant to process gas corrosion and dust

4. Variable frequency drive, which can dynamically adjust the speed according to the load

5. Built in multiple sensors to monitor temperature, pressure, and vibration status

6. Multiple protections against overheating, overload, and overpressure ensure the safety of the machine

7. Support device bus communication and interface with lithography host system

8. Low vibration output to avoid interference with optical components

9. Optimize the heat dissipation structure and support 24-hour continuous production

10. Reporting fault codes for quick problem identification

11. Modular structure, easy on-site maintenance and disassembly

12. The whole machine is compact, saving equipment installation space

13. Strong gas processing capability, suitable for EUV process exhaust gas

14. Optimizing operational energy consumption to reduce production line electricity costs

15. Standard pipeline interface, easy system docking and replacement

The Edwards EUV3050H vacuum dry pump is specially designed for advanced EUV lithography and is a key front-end pumping equipment for extreme ultraviolet exposure vacuum systems.

Product imag

ontroller Module

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MVME2100 controller card
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