MKS AX7685-200 Remote Plasma Source

MKS AX7685-200 Remote Plasma Source 

 Introduction

The MKS AX7685-20 remote plasma source is a high flow RPS chamber cleaning unit that generates active free radicals for dry cleaning of process chambers. The core product features are as follows:

1. Large volume plasma chamber with high gas dissociation efficiency

2. High output of free radicals, suitable for high flow NF3 process gases

3. Reduce wafer charge damage and adopt remote discharge design

4. Compatible with various chamber cleaning gases such as NF3 and O2

5. Wide pressure flow range, strong process adaptability

6. Rapid plasma ignition shortens the cleaning cycle of the chamber

7. Real time monitoring of operating parameters such as power and temperature

8. Multiple fault protection against overheating, overcurrent, and arc ignition

9. Support device bus communication and interface with the main control system of the machine

10. Fault code output for easy and quick identification of anomalies

11. Integrated structure of the whole machine, with small space occupation for equipment integration

12. Anti corrosion chamber components extend the service life of components

13. Water cooling and heat dissipation, supporting long-term continuous operation of the production line

14. Modular design, convenient on-site disassembly, maintenance, and replacement

15. Uniform free radical output and consistent cavity cleaning effect

The MKS AX7685-20 remote plasma source has stable performance and is commonly used for dry cleaning of process chambers in CVD and ALD equipment.

Product imag

ontroller Module

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UAD206A101 3BHE019958R0101 controller card
UCD224A103 3BHE023681R0103 Control module

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