Advanced Energy 3150058-002 RF Generator

Advanced Energy 3150058-002 RF Generator 

 Introduction

Advanced Energy 3150058-002 RF Generator (RF-20RWC) provides stable RF power output for semiconductor plasma processes.

Product Features

1. High precision output power control, stable power output under plasma conditions

2. Built in arc suppression protection, quick handling of ignition, reducing process losses

3. Water cooling and heat dissipation design, capable of supporting long-term continuous full load operation

4. Capable of local panel operation and supporting remote control of analog signals

5. Rack mounted standard chassis, suitable for installation in semiconductor equipment cabinets

Product Specifications

1. Three phase input 208VAC, 50/60Hz

2. Rated output power 2000W, output frequency 12.56MHz

3. Water cooling method ensures the overall heat dissipation performance of the machine

4. Supports analog interfaces and can be integrated with device control systems

5. Standard industrial rack installation structure

Application Areas

1. Semiconductor plasma etching process equipment

2. Thin film deposition PVD process chamber

3. Semiconductor cavity cleaning process system

4. Vacuum plasma processing equipment

5. Research vacuum plasma experimental platform

The Advanced Energy 3150058-002 RF generator is a commonly used RF power spare part in semiconductor process equipment.

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