AMAT 0090-36276 Reactor

AMAT 0090-36276 Reactor 

 Introduction

AMAT 0090-36276 is an application material DPA process reactor assembly, which belongs to the core reaction chamber component of the ion implantation machine and completes the wafer ion doping process.

Product Features:

1. Original factory complete set of chamber assembly, compatible with AMAT ion implantation equipment, with strong interchangeability of the entire assembly

2. The material of the chamber is resistant to high-energy ion bombardment, plasma corrosion, and reduces particle generation

3. Integrate gas path, cooling, and sensing points to achieve process gas introduction and chamber status monitoring

4. Vacuum sealed structure ensures high vacuum environment in the chamber and reduces process impurity pollution

5. Industrial durable structure, supporting long-term batch wafer injection operations on semiconductor production lines

Product Parameters:

1. Model: 0090-36276

2. Component type: DPA reactor assembly

3. Applicable equipment: AMAT semiconductor ion implantation machine

4. Working environment: High vacuum ion doping process chamber

5. Function: Wafer ion implantation reaction processing

Application fields:

1. Semiconductor ion implantation equipment wafer doping reaction chamber

2. Ion beam processing to achieve wafer ion doping process

3. Core cavity spare parts for ion implantation section in integrated circuit manufacturing

4. Replacement and repair of the faulty assembly in the reactor chamber of the machine

5. Spare parts inventory reserve for semiconductor ion implantation equipment

The 0090-36276 reactor assembly is the core process chamber of the ion implantation machine, which directly determines the effect and yield of the wafer ion doping process

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