KLA Tencor 720-23743-000 amplifier module
Product Details Introduction
KLA Tencor 720-23743-000 Amplifier Module
product overview
The KLA Tencor 720-23743-000 amplifier module is a critical electronic component integrated into KLA Tencor wafer inspection, measurement, or scanning equipment, used for signal amplification processing to ensure that weak analog signals can be transmitted to the post-processing system with high fidelity. This module typically works in conjunction with photodetectors, sensors, or scanning probes, playing a central role in nanoscale detection tasks.
major function
Weak signal amplification
Amplify low-level analog signals from sensors or detectors with high gain to enhance signal strength, making them suitable for subsequent ADC conversion and digital processing.
Signal filtering and shaping
Internally integrated low-pass or band-pass filtering circuits are used to suppress high-frequency noise and interference, improve signal-to-noise ratio (SNR), and output more stable signal waveforms.
Impedance matching and isolation
Provide input/output impedance matching to avoid signal reflection, ensure electrical compatibility and stable communication with other modules.
Protection and voltage stabilization mechanism
Equipped with overvoltage, overcurrent, and short-circuit protection functions, it can automatically disconnect the output in abnormal situations to prevent equipment damage.
Technical Characteristics
High gain linear amplifier circuit, suitable for signal inputs ranging from nanovolts to millivolts;
Low noise amplifier chip (LNA), maintaining high signal fidelity;
Broadband response, suitable for high-speed scanning and high-frequency image acquisition tasks;
Stable operating temperature range: supports industrial grade environments (usually 0 ° C~70 ° C or wider);
Modular packaging design facilitates quick on-site replacement, debugging, and maintenance.
Typical application scenarios
Wafer defect detection system
Process weak signals obtained from photoelectric probes to analyze and judge micro - or nano scale defects.
optical imaging system
Linked with image sensors, it is used to enhance the acquisition of image signals under low light conditions, improve imaging resolution and clarity.
Particle monitoring equipment
Amplify the detected particle collision signals to enhance the sensitivity and recognition rate of the analysis system.
Surface contour measurement equipment
Paired with laser interferometers or micro displacement sensors, output electrical signals of surface changes to achieve high-precision detection.
Product imag

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