Kashiyama NV60N-10 Semiconductor Dry Vacuum Pump

Kashiyama NV60N-10 Semiconductor Dry Vacuum Pump 

 Introduction

Kashiyama NV60N-10 semiconductor dry vacuum pump, multi-stage claw type oil-free dry pump, designed specifically for rough pumping conditions of semiconductor equipment, clean and durable.

Product Features:

1. Fully dry oil-free claw structure, no oil vapor reflux, obtaining a clean vacuum environment

2. The rotor operates without contact, with minimal mechanical wear, and can run continuously in mass production for a long time

3. Equipped with gas purging function, it can handle water vapor and mildly corrosive gases in the process

4. Air cooled structure, no need for cooling water, small overall size for easy equipment integration

5. Comes with a status monitoring interface, supports fault signal output, and is convenient for equipment maintenance

Product Parameters:

1. Pump type: Multi stage claw dry vacuum pump

2. Extraction speed: 600L/min

3. Extreme vacuum: 2Pa

4. Power supply: three-phase AC200-220V

5. Inlet flange NW40, exhaust flange NW25

Application fields:

1. Rough exhaust of semiconductor load lock chamber

2. Vacuum acquisition of wafer transfer chamber

3. Pre stage vacuum pumping of etching equipment

4. Thin film deposition equipment is equipped with a coarse vacuum source

5. Plasma cleaning equipment vacuum unit

The Kashiyama NV60N-10 is a reliable front-end dry pump for semiconductor production lines due to its resistance to process gases and compact body design.

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