AE 3156360-141 RF ablation generator

AE 3156360-141 RF ablation generator 

 Introduction

AE 3156360-141 RF power supply, specialized RF generator for semiconductor plasma process, stable output power, suitable for plasma excitation in etching and deposition chambers.

Product Features:

1. High precision closed-loop power control, small output fluctuations, ensuring plasma process consistency

2. Built in fault self checking protection, quickly cutting off output due to excessive power and standing wave, protecting the cavity and power supply body

3. Rack mounted standard structure, supporting hot swapping, easy to maintain and replace on site

4. Supports multi-channel industrial communication and can be connected to the equipment master to achieve remote parameter setting and status reading

5. Resist load impedance fluctuations and maintain stable RF output even when the cavity operating conditions change

Product Parameters:

1. Equipment type: 13.56MHz RF generator

2. Rated output power: 6000W

3. Operating frequency: 13.56MHz

4. Communication interface: Ethernet, analog IO interface

5. Working temperature: 5-50 ℃, cabinet rack installation

Application fields:

1. Plasma excitation power supply for semiconductor etching equipment cavity

2. PVD and CVD thin film deposition process RF source

3. RF energy supply for plasma cleaning equipment

4. Equipment for wafer surface treatment and debonding process

5. Vacuum coating industrial plasma process system

The stable high-power RF output performance makes AE 3156360-141 the core power supply component in semiconductor plasma processes.

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