Novellus 27-033321-00 Turbomolecular Pump

Novellus 27-033321-00 Turbomolecular Pump 

 Introduction

Novellus 27-033321-00 is a specialized turbo molecular pump for semiconductor thin film equipment, used to obtain high vacuum in the chamber and adapt to Novellus deposition process machines.

Product Features:

1. Magnetic levitation bearing structure, oil-free lubrication, to avoid contamination of the process chamber

2. Corrosion resistant process exhaust gas, suitable for thin film processing conditions such as PECVD

3. Stable speed, low vibration, ensuring uniformity of thin film process

4. Support machine bus communication, can be linked for start stop and status monitoring

5. Built in overcurrent, overheating, and abnormal pre stage pressure alarm protection

Product Parameters:

1. Extraction speed (N ₂): 320L/s

2. Extreme vacuum: ≤ 1 × 10 ⁻⁷ Pa

3. Bearing form: magnetic levitation

4. Cooling method: Water cooling

5. Power supply: 200-240V 50/60Hz

Application fields:

1. Novellus PECVD thin film deposition chamber high vacuum extraction

2. Vacuum unit for semiconductor thin film process equipment

3. Vacuum maintenance in wafer processing chamber

4. Replacement of high vacuum spare parts for process chambers

5. Vacuum system for semiconductor coating equipment

Novellus 27-033321-00 can provide a clean and stable high vacuum environment for semiconductor thin film processes

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