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  • Edwards PT66-1Z-000 Semiconductor Turbomolecular Pump
  • Edwards PT66-1Z-000 Semiconductor Turbomolecular Pump
  • Edwards PT66-1Z-000 Semiconductor Turbomolecular Pump
Edwards PT66-1Z-000 Semiconductor Turbomolecular Pump Edwards PT66-1Z-000 Semiconductor Turbomolecular Pump Edwards PT66-1Z-000 Semiconductor Turbomolecular Pump

Edwards PT66-1Z-000 Semiconductor Turbomolecular Pump

Edwards PT66-1Z-000 Semiconductor Turbomolecular Pump 

 Introduction

Edwards PT66-1Z-000 is a semiconductor corrosion-resistant magnetic levitation turbo molecular pump, with oil-free and clean pumping, suitable for corrosive process gases.

Application areas

1. High vacuum pumping of semiconductor etching chamber

2. PECVD thin film deposition equipment vacuum unit

3. Vacuum maintenance of ion implantation machine chamber

4. Compound semiconductor wafer process vacuum system

5. Rapid vacuuming of semiconductor load lock chamber

6. Extraction of corrosive gas under dry etching conditions

7. Chip measurement and testing equipment vacuum chamber

8. Advanced packaging technology vacuum equipment

9. Research ultra-high vacuum experimental platform

10. Optical vacuum coating machine vacuum pumping unit

Product Parameters

1. Magnetic levitation bearing structure, no mechanical contact, low vibration, long service life

2. Anti corrosion internal coating, compatible with halogen corrosive process gases

3. Water cooling and heat dissipation, supporting 7 × 24-hour continuous operation of semiconductor production lines

4. Built in digital communication interface for remote monitoring of pump operation status

5. Equipped with multiple fault protections for overcurrent, overheating, and vibration exceeding limits

In summary, the Edwards PT66-1Z-000 molecular pump is corrosion-resistant, clean, and operates stably, making it the core vacuum pumping component for semiconductor etching and thin film processes

Product imag

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