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  • Spectrum 0190-22201 RF Generator
  • Spectrum 0190-22201 RF Generator
  • Spectrum 0190-22201 RF Generator
Spectrum 0190-22201 RF Generator Spectrum 0190-22201 RF Generator Spectrum 0190-22201 RF Generator

Spectrum 0190-22201 RF Generator

Spectrum 0190-22201 RF Generator   

 Introduction

#Spectrum 0190-22201 RF Generator Product Features

Spectrum 0190-22201 semiconductor RF generator, used to drive plasma etching deposition process, with the following characteristics:

1. Operating frequency range of 1.8-2.17MHz, suitable for low-frequency plasma process requirements

2. Power closed-loop control, with small output power fluctuations and high process consistency

3. Built in fast frequency scanning function, adaptable to dynamic changes in load impedance

4. Supports both continuous and pulse output modes, allowing for flexible switching of processes

5. Excellent harmonic suppression performance, reducing clutter interference on the cavity

6. Real time collection of reflected power and automatic protection of internal power devices

7. Built in fault record storage, saving historical alarms for easy troubleshooting

8. Digital communication interface, which can interact with the main control system of the device through linkage

9. Fast power response speed, reducing waiting time for process switching

10. Modular power unit for easy replacement of spare parts on site

11. Multiple hardware protection mechanisms including over temperature, over current, and over reflection

12. Rack mounted compact structure, suitable for narrow installation positions in equipment cabinets

13. Equipped with remote local dual operation mode, convenient debugging and operation

14. Meets semiconductor SEMI safety standards and is compatible with factory production

15. Resist power grid fluctuations and maintain stable output under voltage fluctuation conditions

Spectrum 0190-22201 RF generator, with stable power and complete protection, suitable for semiconductor plasma related processes.

Product imag

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