AMAT 0090-05537 Flow Controller

AMAT 0090-05537 Flow Controller

 Introduction

AMAT 0090-05537

1. Accurate flow control of process gas in semiconductor etching process

2. Real time and stable control of gas supply flow in wafer coating process

3. Special process gas transportation regulation in chip manufacturing clean room

4. Accurate control of internal air intake ratio in thin film deposition equipment

5. 12 inch wafer processing chamber with stable and regulated gas supply and current limiting

6. Semiconductor machine daily malfunction disassembly and replacement of spare parts

7. Quantitative supply control of plasma process gas ratio

8. Fine tuning of gas supply parameters for advanced process research and development experiments

9. Replacement and assembly of flow control unit during machine maintenance and repair

10. Constant adjustment of blowing gas flow rate in dry cleaning process

11. Multi channel process gas synchronous distribution and control in semiconductor production lines

12. Old application materials, equipment, complete machine renovation, supporting accessories

13. Auxiliary gas flow monitoring in the front-end process of chip packaging

14. Automatic current limiting protection chamber equipment in case of process abnormalities

15. Long term uninterrupted precise gas supply control under high cleanliness conditions

AMAT 0090-05537 is a specialized gas flow controller for semiconductor equipment, mainly used for precise flow control of various process gases in wafer processing and equipment maintenance and replacement.

Product imag

ontroller Module

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