Nikon NSR-S208D Dual Optical Lens Assembly

Nikon NSR-S208D Dual Optical Lens Assembly

 Introduction

Nikon NSR-S208D dual optical lens assembly, Nikon KrF lithography machine projection optical module, adopts a dual optical path design to reduce the mask layout and project it onto the wafer surface for photolithography exposure.

Product Features

1. High NA0.82 optical design, capable of achieving 110nm level circuit pattern imaging

2. Low aberration and low stray light, good uniformity of CD line width across the entire wafer

3. Dual light path collaborative scanning, exposure field of view reaches 26 × 33mm

4. The internal temperature control of the lens is constant to suppress imaging deviation caused by temperature drift

5. Special anti UV optical glass, resistant to long-term irradiation with 248nm KrF laser

6. Polarization optical adaptation to enhance imaging contrast of fine graphics

7. The mirror group is sealed with a dust-free structure to isolate workshop particles from contaminating the lenses

8. Precision calibration of multi-layer optical lenses, with a maximum overlay accuracy of up to 10nm

9. Equipped with optical status monitoring, it can detect lens wear and light intensity attenuation in real time

10. The tube has strong rigidity, reducing image distortion caused by machine vibration

Application Areas

1. Nikon NSR-S208D KrF scanning lithography machine main exposure unit

2. 110nm process photolithography technology for storage chips

3. Lithography of the rear metal layer in logic devices

4. Photolithography manufacturing of power semiconductor devices

5. Advanced packaging mask projection exposure equipment

The Nikon NSR-S208D dual optical lens assembly has stable imaging quality and a large field of view, making it the core optical spare for micro pattern transfer in KrF lithography machines.

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