TEL 3D80-000825-V4 RF Generator

TEL 3D80-000825-V4 RF Generator

 Introduction

TEL 3D80-000825-V4 RF generator, equipped with RF power supply for Tokyo Electronic Machine, supplies RF energy to the process chamber and excites plasma.

Product Features

1. The power output is linearly adjustable and suitable for various process formulas

2. Real time monitoring of reflected power, automatic protection in case of abnormalities

3. Solid state circuit design, fast startup and ignition speed

4. Water cooling for heat dissipation, controllable temperature rise during long-term operation

5. Good RF shielding reduces interference to surrounding boards

6. Support remote control from the upper computer, with sensitive command response

7. Strong load adaptability, and the fluctuation of cavity state is not easy to jump power

8. The fault code is intuitive and convenient for quick on-site troubleshooting

9. Standard rack size, easy replacement and installation of cabinets

10. The components have undergone aging screening and have good stability in mass production

Application Areas

1. TEL etching chamber plasma excitation power supply

2. RF power supply unit for thin film deposition process

3. Wafer plasma cleaning equipment

4. Semiconductor debonding process chamber

5. Vacuum plasma processing system

TEL 3D80-000825-V4 RF generator has stable ignition and precise power control, making it the core RF power supply spare part for TEL semiconductor machine plasma process.

Product imag

ontroller Module

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