MKS 631D13T8FH Capacitive Pressure Gauge

MKS 631D13T8FH Capacitive Pressure Gauge

 Introduction

MKS 631D13T8FH Capacitive Pressure Gauge

1. Using the Baratron capacitive sensing principle, absolute vacuum pressure is measured independently of gas type

2. 631D13T8FH comes with a constant temperature heating structure, effectively suppressing the adhesion of process by-products to the sensor

3. Range of 1000Torr, high measurement accuracy, ensuring repeatability of semiconductor cavity pressure process

4. Inconel alloy film, strong corrosion resistance, suitable for various process gases such as etching and CVD

5. 631D13T8FH outputs 0-10VDC standard analog signals, making it easy to connect with the machine's main control system

6. Built in two adjustable pressure relays, capable of achieving pressure threshold linkage control

7. Integrated over temperature and over voltage protection circuits to protect sensing core components under abnormal operating conditions

8. 8VCR standard vacuum interface, excellent sealing performance, easy disassembly and assembly, compatible with vacuum pipelines

9. 631D13T8FH has a built-in signal conditioning circuit to reduce signal noise introduced by external cables

10. Long term operation with low temperature drift reduces on-site calibration frequency and lowers operation and maintenance costs

11. Equipped with status indicator lights, providing intuitive feedback on heating and sensing operating conditions

12. 631D13T8FH is resistant to radio frequency interference and can operate stably around the radio frequency process chamber

13. Integrated structure, no need for external signal modules, saving cabinet installation space

14. Factory calibration and aging testing have been completed, with excellent parameter consistency

15. Following the original specifications of MKS, spare parts of the same model 631D13T8FH can be directly exchanged

The MKS 631D13T8FH capacitive pressure gauge is the core pressure monitoring component of semiconductor vacuum equipment, widely used for pressure monitoring and maintenance replacement of coating and etching chambers.

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