AERA 3030-07404 Mass Flow Controller
Introduction
AERA 3030-07404 Mass Flow Controller
1. Precise control of process gas flow rate, high precision of flow control
2. Fast response speed, able to quickly reach the set flow value
3. Built in temperature compensation to reduce flow deviation caused by ambient temperature
4. Equipped with multiple overload and abnormal pressure protection functions
5. Standard communication interface, easy to interface with device control system
6. Compact body structure, saving equipment installation space
7. Built in real-time traffic monitoring for easy monitoring of process status
8. Excellent sealing performance, suitable for high-purity process gas working conditions
9. Support long-term uninterrupted continuous process operation
10. Anti vibration design ensures stable operation of the equipment in the operating environment
11. Parameter power-off memory, no need to repeatedly debug settings when restarting
12. The gas pathway is clean and meets the requirements of semiconductor clean process
13. Good flow linearity and stable wide range adjustment
14. Easy disassembly and assembly structure, convenient on-site maintenance and replacement
15. Mature sensing solution with minimal drift during long-term operation
The AERA 3030-07404 mass flow controller is commonly used in semiconductor thin film process equipment as a core component for precise flow control of process gases.
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