Varian E11049670 Semiconductor Equipment

Varian E11049670 Semiconductor Equipment 

 Introduction

The Varian E11049670 focusing Faraday cup is the core dose detection component of an ion implantation machine, which collects ion beam current signals in real time.

Product Features:

1. Precise beam capture structure, which can accurately calculate ion implantation dose and ensure doping uniformity

2. Anti ion bombardment design, able to withstand sustained impact of high-energy ions and extend service life

3. Integrated shielding structure to suppress stray charge interference and reduce beam measurement errors

4. Modular assembly, can be disassembled and maintained separately, without the need to disassemble the entire ion light path

5. Built in cooling channel to absorb the heat brought by the beam and maintain detection stability

Product Parameters:

6. Model: E11049670

7. Component type: Focus Faraday Cup

8. Compatible equipment: Varian ion implantation machine

9. Detection object: high-energy ion beam current

10. Output: Weak current detection signal

Application fields:

11. Dose monitoring of semiconductor ion implantation process

12. Real time sampling of wafer doped ion beam current

13. Beam current calibration of medium beam ion implantation machine

14. Doping process for power device wafers

15. Replacement of spare parts for Varian ion implantation machine Faraday cup

Ion doping machine beam detection and maintenance, Varian E11049670 focusing Faraday cup can restore the original dose detection accuracy.

Product imag

ontroller Module

IC693MDL231 Gas turbine module
2711-K5A8 Touch screen
GDC801B101 3BHE051592R0101 controller

Other website links

Honeywell USI-0002 安全管理器
469-P1-HI-A20-T 电动机保护继电器
IC695CPE330 可编程自动控制器模块