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  • Tokyo Electron 3D80-000214-V4 Controller Module
  • Tokyo Electron 3D80-000214-V4 Controller Module
  • Tokyo Electron 3D80-000214-V4 Controller Module
Tokyo Electron 3D80-000214-V4 Controller Module Tokyo Electron 3D80-000214-V4 Controller Module Tokyo Electron 3D80-000214-V4 Controller Module

Tokyo Electron 3D80-000214-V4 Controller Module

  • Goods status: new/used
  • Delivery date: stock
  • The quality assurance period: 365 days
  • Phone/WhatsApp/WeChat:+86 15270269218
  • Email:stodcdcs@gmail.com
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Tokyo Electron 3D80-000214-V4 Controller Module

Product Details Introduction

The Tokyo Electron 3D80-000214-V4 controller module is an intelligent control component specifically designed for semiconductor manufacturing equipment, mainly used to implement internal process flow, subsystem management, and precision parameter control functions of the equipment. This module is one of the core control units in TEL (Tokyo Electron) high-end equipment platforms, such as etching, deposition, and other systems.


1、 Product functional positioning

Module Type: Process Controller/System Controller


Functional features:


Manage equipment operation logic, control instructions, and status monitoring;


Real time data exchange with the device control system;


Control the execution of subsystems such as gas flow rate, temperature, vacuum, pressure, RF power, etc;


Support functions such as external signal input and output, alarm response, and fault diagnosis.


2、 Application field analysis

Etch Systems etching equipment

Control the gas ratio, pressure control, and RF power output inside the chamber;


Manage the action logic of sub components such as cavity doors, lifting mechanisms, heating plates, etc;


Communicate with the upper MES system and equipment host (such as PLC or industrial PC).


2. Chemical vapor deposition equipment (CVD/ALD)

Real time control of sedimentation period and film thickness;


Adjust the precursor gas flow rate, temperature setting, and vacuum state;


Provide an interface for collecting process stability data.


3. Cleaning/developing equipment

Manage the processes of cleaning nozzles, water vapor ratio, motor movement, drying, etc;


Implement action sequence, time setting, and anomaly monitoring.

Product imag

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