Tokyo Electron 3397-2200047-2X chiller component

Tokyo Electron 3397-2200047-2X chiller component

Product Details Introduction

The Tokyo Electron 3397-2200047-2X chiller unit is a thermal management subsystem specifically designed for TEL semiconductor manufacturing equipment. It is primarily used to control the temperature of critical components in process equipment, ensuring their operation in high-precision and high stability environments. This component is typically integrated into high vacuum, high-temperature process platforms such as etching, deposition, and photolithography.

1、 Product Function Overview

Equipment type: chiller component (liquid cooling circulation unit)

Main functions:

Provide stable coolant temperature for the equipment;

Adjust the operating temperature of the cavity, heating plate, RF power supply, or laser light source;

Integrate with the main control system to achieve dynamic temperature control and abnormal alarm.

2、 Core application areas

1. Plasma Etcher

Cooling reaction chamber, substrate platform, and RF matching network;

Reduce the temperature of the cavity wall, suppress particle generation, and improve etching uniformity and yield.

2. CVD/ALD deposition equipment

Thermal management system for controlling deposition chambers, substrates, pipelines, etc;

Prevent material crystallization or uneven deposition, and improve film thickness consistency.

3. Photolithography system

Stable operating temperature of light source modules (such as lasers and LEDs);

Support thermal compensation and heat dissipation for exposure platforms and lens components.

4. Developing/cleaning equipment

Control the temperature of chemical liquids (such as developer, adhesive remover) or cleaning chambers;

Ensure that the process liquid reacts at the set temperature and avoid excessive or insufficient cleaning.

Product imag

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