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  • KLA Tencor 710-657058-20 Drive
  • KLA Tencor 710-657058-20 Drive
KLA Tencor 710-657058-20 Drive KLA Tencor 710-657058-20 Drive

KLA Tencor 710-657058-20 Drive

KLA Tencor 710-657058-20 Drive

Product Details Introduction

KLA Tencor 710-657058-20 Driver Product Application Fields Detailed Explanation

Core driver of autofocus system


This driver is used to control the LED light source inside the autofocus module, ensuring the stability and accuracy of the light source output, thereby achieving clear focusing of images during wafer inspection.


Automatic focusing is crucial for improving detection accuracy, especially in semiconductor wafer inspection with multi-layer stacked patterns, ensuring that each layer pattern can be accurately aligned.


Semiconductor wafer testing equipment


Applied to KLA Tencor wafer inspection equipment, it supports high-precision and high-speed surface defect detection, morphology measurement, and other functions.


The driver controls the light source to ensure stable and uniform illumination conditions provided by the optical system, thereby improving the sensitivity and reliability of the detection system.


Optical signal regulation and stability


This driver is responsible for adjusting the brightness and pulse signal of the light source, ensuring that the optical components receive stable light energy and avoiding measurement errors caused by fluctuations in the light source.


By finely controlling the LED light source, it supports optical adjustment requirements in multiple detection modes, such as changes in light intensity, wavelength, etc.


Equipment maintenance and system upgrade support


Adopting modular design, it facilitates maintenance personnel to quickly replace drives and reduces equipment downtime.


The driver has strong compatibility, supports future functional expansion and technological upgrades of the system, and improves the service life and investment return of the equipment.


Industrial environment adaptability


The design meets the strict requirements of semiconductor manufacturing cleanrooms and industrial environments, with good anti-interference ability and long-term stability.


Support continuous and high load operation to ensure stable production of the production line.


Improve production yield and testing efficiency


By precise control of autofocus and light source, the detection accuracy is significantly improved, helping customers quickly detect defects and reduce the rate of defective products.


Accelerate detection speed, shorten detection cycle, and meet the high efficiency requirements of large-scale wafer manufacturing.


Integrated into various detection devices and platforms


The KLA Tencor inspection system can be widely applied to different models and configurations, including wafer surface defect detection, thickness measurement, contour scanning, etc.


An optical platform that supports multiple detection technologies is an important component for achieving highly automated and intelligent detection.

Product imag

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S22HSNA-RNNM-04SC101-001-T4S31GMNH-RNNE-00
S22HSNA-HFNL-02SC322A-001-01S34GNNA-RNNM-00
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S22GNNA-RNVS-02SC402-023-T4SC103-001-T1
S22GNNA-RNNM-00SC402-012-T4SC103-001-T3


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