AMAT 0190-54142 RF Generator

AMAT 0190-54142 RF Generator 

 Introduction

AMAT 0190-54142 is a high-power RF generator made of RGA-10K material, which provides stable RF energy for plasma processes and is used in conjunction with AMAT thin film machines.

1. Adopting a wide load adaptation design, the power output remains stable even when the cavity impedance fluctuates;

2. Support multi level pulse waveform editing, flexible adjustment of duty cycle to adapt to different thin film processes;

3. Built in multi-level power protection, automatic power reduction when the reflected power exceeds the limit, to avoid damage to the cavity and power supply;

4. Comes with local diagnostic function, can read operation logs, shorten troubleshooting time;

5. Integrated water-cooled cooling structure, capable of continuous operation at full power for a long time, with strong stability in mass production.

1. Operating frequency 13.56MHz;

2. Rated output power of 10000W;

3. Standard output impedance of 50 Ω;

4. Maximum tolerable reflection power of 1200W;

5. Compatible with AMAT PVD series machines.

1. Metal sputtering PVD chamber plasma RF power supply;

2. Deposition process of multi-layer metal thin films on wafers;

3. Preparation of hard mask layer by plasma sputtering;

4. Power supply for semiconductor metallization process chambers;

5. RF source for large cavity plasma coating equipment.

This 0190-54142 is a high-power RF unit with abundant output energy, and is a core RF spare part in PVD equipment for application materials

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