Edwards PT21FZ000X5 Turbomolecular Pump

Edwards PT21FZ000X5 Turbomolecular Pump 

 Introduction

Edwards PT21FZ000X5 is a compact turbo molecular pump designed by Edwards to achieve high vacuum in semiconductor machines.

1. High speed rotor, fast pumping speed, quickly increases the vacuum in the chamber;

2. Oil free and clean design, which will not contaminate the wafer process chamber;

3. Built in sensors for real-time monitoring of speed, temperature, and vibration;

4. Integrated drive control, which can be directly connected to the main control of the machine;

5. Compact structure, suitable for direct installation on the side of the cavity.

1. Pump type: Turbomolecular pump;

2. Bearings: Ceramic bearings;

3. Cooling method: air cooling;

4. Communication: Digital signal docking machine;

5. Compatible with etching and ion implantation series equipment.

1. High vacuum maintenance of semiconductor dry etching chamber;

2. Vacuum pumping of ion implantation machine chamber;

3. Establishment of molecular flow environment in vacuum process chamber;

4. Exhaust the chamber after machine maintenance;

5. High vacuum core unit for semiconductor equipment.

This PT21FZ000X5 is a clean high vacuum spare part, which ensures the vacuum degree of the chamber.

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