Daihen 3D80-001479-V2 RF Generator

Daihen 3D80-001479-V2 RF Generator 

 Introduction

Daihen 3D80-001479-V2 is a Daheng digital RF generator that provides stable RF power for semiconductor plasma processes.

1. Digital power closed-loop control, stable output power, and good process repeatability;

2. Support multi-level pulse modulation, adjustable waveform, suitable for fine plasma processes;

3. Built in multiple protections, automatically cutting off the output when the reflected power exceeds the standard, protecting the cavity and power supply;

4. Rich communication interfaces that can be linked in real-time with RF adapters and machine controllers;

5. The whole machine is water-cooled and can operate continuously at full load for a long time, which is suitable for mass production lines.

1. Operating frequency 13.56MHz;

2. Rated output power of 4000W;

3. Standard output impedance of 50 Ω;

4. Maximum tolerable reflection power of 800W;

5. Power supply AC200V single-phase.

1. Plasma RF power supply for semiconductor etching chamber;

2. PVD sputtering thin film deposition power supply;

3. High aspect ratio CVD film growth process;

4. Plasma cleaning treatment of wafer surface;

5. Various high-end plasma process cavity RF sources.

This 3D80-001479-V2 has precise digital control and strong anti-interference ability, making it a mainstream high-power RF power supply in semiconductor equipment.

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