MKS 3Z80-000036-V3 RF Generator

MKS 3Z80-000036-V3 RF Generator 

 Introduction

MKS 3Z80-000036-V3 RF generator is a high-frequency power supply unit for generating plasma in semiconductor machines.

Product Features:

1. Stable power output with minimal plasma fluctuations during load changes

2. Built in multiple protections, standing wave, over temperature overload will quickly cut off the output

3. Supports pulse mode and adapts to various etching and coating process requirements

4. The whole machine has good heat dissipation performance and is suitable for continuous production of 7 × 24 hours on the production line

5. Standard original interface, easy to replace with matching device on the machine

Product Parameters:

1. Compatible with original factory communication and can work in conjunction with external impedance matching devices

2. Equipped with standing wave detection, real-time monitoring of reflected power in the circuit

3. Adapt to the normal working temperature environment inside the cabinet

4. Support remote issuance of power control commands for the entire machine

5. Fault output alarm signal, convenient for maintenance and troubleshooting

Application fields:

1. Semiconductor etching chamber plasma excitation power supply

2. PECVD thin film deposition equipment RF power supply matching

3. Power supply for wafer plasma cleaning process

4. Replacement of aging spare parts for RF power supply of imported machines

5. After equipment maintenance, plasma process debugging and use

MKS 3Z80-000036-V3 directly determines the plasma state of the chamber and is crucial for the yield of wafer processing technology.

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