Koshuha MBA-010-H-2 RF Matching Box

Koshuha MBA-010-H-2 RF Matching Box 

 Introduction

Koshuha MBA-010-H-2 is a Japanese high-frequency automatic RF matching box with a filtering unit used to match the impedance between the RF power supply and the process chamber, reducing reflected power.

1. Built in automatic tuning capacitor, quickly matches when the cavity impedance changes, reducing reflected RF power

2. Integrated filtering components to suppress harmonic interference and protect RF power supply

3. Water cooled heat dissipation structure, controllable temperature rise for long-term continuous operation

4. Equipped with a communication interface, it can be linked with the host and provide real-time feedback on the matching status

5. Compact body, suitable for installation inside semiconductor etching and deposition machines

6. Rated power 1kW

7. Operating frequency 13.56MHz

8. Standard impedance 50 Ω

9. Supporting filter model FLU-450B-03

10. Water cooling method

11. RF impedance matching of semiconductor plasma etching chamber

12. RF circuit adjustment of PVD thin film deposition equipment

13. CVD plasma process chamber power matching

14. RF system matching for plasma cleaning equipment

15. Impedance adaptation of various wafer plasma process equipment

This MBA-010-H-2 is very stable in plasma technology and can stabilize RF power output. It is a common matching unit in many second-hand semiconductor equipment

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